Atomic Layer Deposition: Principles, Characteristics, And Nanotechnology Applications
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Atomic Layer Deposition: Principles, Characteristics, And Nanotechnology Applications

by Tommi Kaariainen

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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Product Details

  • Number of Pages : 272
  • Publisher : John Wiley
  • Weight : 572g
  • Product Code : 9781118062777